Imaging Layers for the Directed Assembly of Block Copolymer Films: Dependence of the Physical and Chemical Properties of Patterned Polymer Brushes on Brush Molecular Weight

Patterning nanoscale features requires advanced lithographic techniques that involve redesigning the traditional photolithographic process. As feature dimensions shrink below 30 nm, the fidelity of the transferred information using current resists may not meet manufacturing requirements, particularly with respect to control over the size and shape of the patterned features (e.g. critical dimension control and line edge roughness). We are investigating the integration of self-assembling block copolymers into the lithographic process such that the materials themselves contribute valuable information towards the desired ends. At the same time we retain essential process attributes such as pattern perfection, registration and the ability to pattern non-regular device-oriented structures.